Smoltek's pioneering CNF-MIM technology paves the way for ultra-thin capacitors

The market for ultra-thin capacitors is expected to grow strongly in the coming years, especially for advanced electronic applications such as AI, data centers and mobile devices.

Smoltek continues to develop the company's capacitor technology, CNF-MIM, to meet these needs and has recently conducted an interview with Philip Lessner, CTO of Yageo Group, one of the world's largest capacitor manufacturers, where he confirms significant progress in technology development.

“Smoltek has really made two major advances in capacitor technology. One is that you switch to a stack with a much higher dielectric constant [sic!], which ultimately allows for higher capacitance capacitors. The other big advance is that you can grow better vertical carbon nanofibers. I have seen the images from the scanning electron microscope, and they are very impressive”, says Philip Lessner.

In the interview, Philip Lessner also emphasizes the technical advantage of Smoltek's manufacturing process. Unlike market leaders such as TSMC, Murata and Samsung, which use a method where material is etched away, Smoltek builds up the structures by adding material where it is needed. This results in a more stable substrate.

“The advantage is that Smoltek has a unique capacitor technology that differs from the technology that competitors have invested in, and that has the potential to surpass the performance of the existing technology once it is fully developed”, says Philip Lessner.

The interview also covers new market segments beyond mobile phones, technical possibilities for future applications and the development plan for the commercialization of the technology.

Article with link to the full interview is published on Smoltek's IR blog: www.smoltek.com/8008.

Datum 2024-12-10, kl 15:00
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