Smoltek

Smoltek has been awarded three new patents. Each one of these relates to a new patent family, all of them describing how we can use Smoltek's core technology for reducing contact resistance in electrochemical cells.

Electrochemical cells are found in widespread applications in modern energy systems, such as batteries, fuel cells and electrolyzers. However, existing chemical cells possess high contact resistance between different components of the cell which leads to lower efficiency. This problem may even be worsened by the formation of non-conducting surface layers on some components due to the harsh environment of the cell.

"With these three new patent families, we are really strengthening the scope our IP portfolio within the field of increasing the efficiency in electrochemical cells, both for electrolyzers and fuel cells", says Fabian Wenger, Head of R&D at Smoltek Hydrogen. 

"It is very valuable for us to have a platform of patents that have wider areas of use than in just PEM electrolyzers, especially when we are talking to different companies in the hydrogen industry, who often work both with fuel cells and several different types of electrolyzers. This opens new opportunities for our business", says Ellinor Ehrnberg, President of Smoltek Hydrogen.

Innovation description of the new patent families

Contact Resistance patent family: The Innovation improve a separator plate arrangement for an electrochemical cell by comprising a nanostructure which offers lowered contact resistance between the separator element and the diffusion layer.

Nano Velcro patent family: The Innovation improves the interlayer connections in electrochemical cells by using elongated nanostructures that are mechanically entangled between the layers.

Vertical Graphene patent family: The Innovation offer lowered contact resistance between separator elements and adjacent components in electrochemical cells and increase resistance to corrosion.

Smoltek's patent portfolio now globally comprise 87 granted patents in 20 patent families. Read more about our IP and patents.